Pilot line for continuous roll-to-roll NIL processes on flexible substrates

This pilot line enables continous nanostructuring on large área and flexible substrates. The system includes two modules: UV-NIL and thermal- NIL. In-situ optical inspection is integrated in the pilot lane to guarantee a zero defect process.

The video shows the thermal NIL processes on polycarbonate to obtain antireflective surfaces. Antireflective structures are replicated on the thermoplastic by using a flexible nickel stamp produced at IK4-TEKNIKER. Surface quality and integrity of the final nanostructured films controlled via process optimization, tuning the pressure, temperature and process speed (in the range of 0.05 to 5 m/min).

The applications of this technology are in bioinspired surfaces: Antireflective, self-cleaning, tunable adhesion, fluid-drag reduction, antifouling, tunable coloration, holographic labels, etc.

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Roll-to-roll,R2R,nanoimprint lithography,NIL,technology,